|Título||Energy loss of proton, [alpha] particle, and electron beams in hafnium dioxide films
Fadanelli Filho, Raul Carlos
Abril Sanches, Isabel
Denton, Cristian D.
Nagamine, Luiz Carlos Camargo Miranda
|Abstract||The electronic stopping power, S, of HfO₂ films for proton and alpha particle beams has been measured and calculated. The experimental data have been obtained by the Rutherford backscattering technique and cover the range of 120–900 and 120–3000 keV for proton and alpha particle beams, respectively. Theoretical calculations of the energy loss for the same projectiles have been done by means of the dielectric formalism using the Mermin energy loss function—generalized oscillator strength (MELF-GOS) model for a proper description of the HfO₂ target on the whole momentum-energy excitation spectrum. At low projectile energies, a nonlinear theory based on the extended Friedel sum rule has been employed. The calculations and experimental measurements show good agreement for protons and a quite good one for alpha particles. In particular, the experimental maximums of both stopping curves (around 120 and 800 keV, respectively) are well reproduced. On the basis of this good agreement, we have also calculated the inelastic mean-free path IMFP and the stopping power for electrons in HfO₂ films. Our results predict a minimum value of the IMFP and a maximum value of the S for electrons with energies around 120 and 190 eV, respectively.
|Contido em||Physical review. A. Atomic, molecular, and optical physics. New York. Vol. 80, no. 6 (Dec. 2009), 062901, 8 p.
Compostos de háfnio
Efeitos de feixes de elétrons
Efeitos de prótons
Fisica atomica e molecular
Perda de energia de particulas
|Tipo||Artigo de periódico
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