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Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate

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Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate

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Título Effects of carbon on dynamic annealing and on electrical activation of dopants in silicon substrate
Autor Souza, Joel Pereira de
Boudinov, Henri Ivanov
Fichtner, Paulo Fernando Papaleo
Abstract The effect of C on the implantation damage accumulation in Si crystal and on the electrical T activation of dopants was investigated, using RBS-channeling technique, sheet resistivity and Hall measurements. The damage profiles in Si implanted with 12C+ or llBS at 50 keV to the same doses and dose rate were compared. It was found that the damage accumulates at a noticeably higher rate during 12c+im plantation than in the case of "B+, especially for doses > 2 x I0l5 ~rn-~I t. i s shown that the dynamic annealing is strongly reduced in regions doped with C. In addition, the influence of C on the electrical activation of the co-implanted dopant is discussed for the case of B and Bi. A model considering an interaction between C and Si self-interstitial (Sir) atoms during implantation and the subsequent thermal annealing is proposed to explain the enhanced implantation damage accumulation and the activation behavior of B in samples co-implanted with C
Contido em Brazilian journal of physics. São Paulo. Vol. 24, no. 2 (June 1994), p. 538-542
Assunto Fisica da materia condensada
Implantacao de ions
Origem Nacional
Tipo Artigo de periódico
URI http://hdl.handle.net/10183/117946
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