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dc.contributor.authorSchelp, Luiz Fernandopt_BR
dc.contributor.authorTosin, Giancarlopt_BR
dc.contributor.authorCarara, Marcos Andrept_BR
dc.contributor.authorBaibich, Mario Norbertopt_BR
dc.contributor.authorGomes, Affonso Augusto Guidãopt_BR
dc.contributor.authorSchmidt, Joao Edgarpt_BR
dc.date.accessioned2016-05-10T02:06:50Zpt_BR
dc.date.issued1992pt_BR
dc.identifier.issn0003-6951pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/140555pt_BR
dc.description.abstractCo( 15 A)/Ag(60 A) multilayers produced by electron beam deposition on a 50 A chromium buffer layer over a Si( 111) wafer have been studied by magnetoresistance, saturation magnetization, coercivity, and anisotropy. Annealing at various temperatures produces striking effects on the observed physical properties, such as an improvement on the value of the magnetoresistance associated to a “back-diffusion” process in the Co/Ag interfaces. This leads one to believe that interface roughness is indeed most important to understanding the connection between giant magnetoresistance and antiferromagnetic coupling, as well as the behavior of coercivity vs interface anisotropy in these materials.en
dc.format.mimetypeapplication/pdfpt_BR
dc.language.isoengpt_BR
dc.relation.ispartofApplied physics letters. New York. Vol. 61, n. 15 (Oct. 1992), p. 1858-1860pt_BR
dc.rightsOpen Accessen
dc.subjectFísica da matéria condensadapt_BR
dc.subjectImplantação de íonspt_BR
dc.subjectInterfacespt_BR
dc.subjectMagnetorresistênciapt_BR
dc.subjectMagnetizaçãopt_BR
dc.titleCo/ag multilayer film : role of annealing on the magnetic propertiespt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000056035pt_BR
dc.type.originEstrangeiropt_BR


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