Analysis of total ionizing dose effects on 0.13 µm technology-temperature-compensated voltage references

dc.contributor.author	Both, Thiago Hanna	pt_BR
dc.contributor.author	Colombo, Dalton Martini	pt_BR
dc.contributor.author	Dallasen, Ricardo Vanni	pt_BR
dc.contributor.author	Wirth, Gilson Inacio	pt_BR
dc.date.accessioned	2022-02-12T04:52:33Z	pt_BR
dc.date.issued	2013	pt_BR
dc.identifier.issn	2175-9146	pt_BR
dc.identifier.uri	http://hdl.handle.net/10183/235096	pt_BR
dc.format.mimetype	application/pdf	pt_BR
dc.language.iso	eng	pt_BR
dc.relation.ispartof	Journal of aerospace technology and management [recurso eletrônico]. São José dos Campos. Vol. 5, no. 3 (July/Sept. 2013), p. 335-340	pt_BR
dc.rights	Open Access	en
dc.subject	Semicondutores	pt_BR
dc.subject	Cmos	pt_BR
dc.subject	Microeletrônica	pt_BR
dc.subject	Efeitos da radiação	pt_BR
dc.title	Analysis of total ionizing dose effects on 0.13 µm technology-temperature-compensated voltage references	pt_BR
dc.type	Artigo de periódico	pt_BR
dc.identifier.nrb	000929783	pt_BR
dc.type.origin	Nacional	pt_BR

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