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Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples

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Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples

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Título Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
Autor Vasconcellos, Marcos Antonio Zen
Lima, Saulo Cordeiro
Hinrichs, Ruth
Abstract Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.
Contido em Revista Matéria. Rio de Janeiro: Coppe/UFRJ, 2010. Vol. 15, n. 2 (jun. 2010), p. 299-302
Assunto Ciência dos materiais
Difracao de raios x
Titanio
[en] Glow discharge
[en] Hardness
[en] Nitride
Origem Nacional
Tipo Artigo de periódico
URI http://hdl.handle.net/10183/29434
Arquivos Descrição Formato
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