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Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples

dc.contributor.authorVasconcellos, Marcos Antonio Zenpt_BR
dc.contributor.authorLima, Saulo Cordeiropt_BR
dc.contributor.authorHinrichs, Ruthpt_BR
dc.date.accessioned2011-06-08T06:00:10Zpt_BR
dc.date.issued2010pt_BR
dc.identifier.issn1517-7076pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/29434pt_BR
dc.description.abstractTitanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.en
dc.format.mimetypeapplication/pdfpt_BR
dc.language.isoengpt_BR
dc.relation.ispartofRevista Matéria. Rio de Janeiro: Coppe/UFRJ, 2010. Vol. 15, n. 2 (jun. 2010), p. 299-302pt_BR
dc.rightsOpen Accessen
dc.subjectGlow dischargeen
dc.subjectCiência dos materiaispt_BR
dc.subjectTitâniopt_BR
dc.subjectNitrideen
dc.subjectHardnessen
dc.subjectDifração de raios Xpt_BR
dc.titleHardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samplespt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000761324pt_BR
dc.type.originNacionalpt_BR


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