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dc.contributor.authorLang, Rossanopt_BR
dc.contributor.authorMenezes, Alan Silva dept_BR
dc.contributor.authorSantos, Adenilson Oliveira dospt_BR
dc.contributor.authorReboh, Shaypt_BR
dc.contributor.authorMeneses, Eliermes Arraespt_BR
dc.contributor.authorAmaral, Liviopt_BR
dc.contributor.authorCardoso, Lisandro Paviept_BR
dc.date.accessioned2014-03-26T01:51:15Zpt_BR
dc.date.issued2013pt_BR
dc.identifier.issn0021-8898pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/89722pt_BR
dc.description.abstractOut-of-plane and primarily in-plane lattice strain distributions, along the two perpendicular crystallographic directions on the subsurface of a silicon layer with embedded FeSi2 nanoparticles, were analyzed and resolved as a function of the synchrotron X-ray beam energy by using ω: mappings of the (111) and (111) Bragg-surface diffraction peaks. The nanoparticles, synthesized by ionbeam- induced epitaxial crystallization of Fe+-implanted Si(001), were observed to have different orientations and morphologies (sphere- and plate-like nanoparticles) within the implanted/recrystallized region. The results show that the shape of the synthesized material singularly affects the surrounding Si lattice. The lattice strain distribution elucidated by the nonconventional X-ray Bragg-surface diffraction technique clearly exhibits an anisotropic effect, predominantly caused by plate-shaped nanoparticles. This type of refined detection reflects a key application of the method, which could be used to allow discrimination of strains in distorted semiconductor substrate layers.en
dc.format.mimetypeapplication/pdfpt_BR
dc.language.isoengpt_BR
dc.relation.ispartofJournal of applied crystallography. Copenhagen. Vol. 46, no. 6 (Dec. 2013), p. 1796–1804pt_BR
dc.rightsOpen Accessen
dc.subjectNanopartículaspt_BR
dc.subjectDifração de raios Xpt_BR
dc.subjectCristalizaçãopt_BR
dc.subjectDeformaçãopt_BR
dc.subjectSilíciopt_BR
dc.titleLattice strain distribution resolved by X-ray Braggsurface diffraction in an Si matrix distorted by embedded FeSi2 nanoparticlespt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000912012pt_BR
dc.type.originEstrangeiropt_BR


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