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Structural and magnetic behavior of ar+-implanted co/pd multilayers : interfacial mixing

dc.contributor.authorSchelp, Luiz Fernandopt_BR
dc.contributor.authorCarara, Marcos Andrept_BR
dc.contributor.authorViegas, Alexandre da Caspt_BR
dc.contributor.authorVasconcellos, Marcos Antonio Zenpt_BR
dc.contributor.authorSchmidt, Joao Edgarpt_BR
dc.date.accessioned2014-05-20T02:04:51Zpt_BR
dc.date.issued1994pt_BR
dc.identifier.issn0021-8979pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/95411pt_BR
dc.description.abstractThe magnetization behavior of Co/Pd multilayers has been analyzed as a function of the degree of interfacial mixing among the Co and Pd layers. Controlled atomic mixing was induced by low-dose and low-flux ion implantation and a follow-up of the structural status of the samples was made by simulation of the high-angle x-ray-diffraction data. Values of the saturation magnetization as a function of the broadness of Co concentration profile are presented and explained by a simple model based on the parameters obtained from the x-ray simulations.en
dc.format.mimetypeapplication/pdfpt_BR
dc.language.isoengpt_BR
dc.relation.ispartofJournal of Applied Physics. Woodbury. Vol. 75, n. 10 (May 1994), p. 5262-5266pt_BR
dc.rightsOpen Accessen
dc.subjectFísica da matéria condensadapt_BR
dc.subjectMagnetizaçãopt_BR
dc.subjectImplantação de íonspt_BR
dc.subjectDifraçãopt_BR
dc.subjectMateriais magnéticospt_BR
dc.subjectDifração de raios Xpt_BR
dc.titleStructural and magnetic behavior of ar+-implanted co/pd multilayers : interfacial mixingpt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000256597pt_BR
dc.type.originEstrangeiropt_BR


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