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The influence of aluminum grain size on alumina nanoporous structure

dc.contributor.authorFeil, Adriano Friedrichpt_BR
dc.contributor.authorCosta, Marlla Vallerius dapt_BR
dc.contributor.authorAmaral, Liviopt_BR
dc.contributor.authorTeixeira, Sergio Ribeiropt_BR
dc.contributor.authorMigowski, Pedropt_BR
dc.contributor.authorDupont, Jairtonpt_BR
dc.contributor.authorMachado, Giovannapt_BR
dc.contributor.authorPeripolli, Suzana Bottegapt_BR
dc.date.accessioned2014-06-06T02:06:36Zpt_BR
dc.date.issued2010pt_BR
dc.identifier.issn0021-8979pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/96124pt_BR
dc.description.abstractAn approach to control the interpore distances and nanopore diameters of 150-nm-thick thin aluminum films is reported here. The Al thin films were grown by sputtering on p-type silicon substrate and anodized with a conventional anodization process in a phosphoric acid solution. It was found that interpore distance and pore diameter are related to the aluminum grain size and can be controlled by annealing. The grain contours limit the sizes of alumina cells. This mechanism is valid for grain sizes supporting only one alumina cell and consequently only one pore.en
dc.format.mimetypeapplication/pdfpt_BR
dc.language.isoengpt_BR
dc.relation.ispartofJournal of applied physics. Melville. Vol. 107, no. 2 (Jan. 2010), 026103, 3 p.pt_BR
dc.rightsOpen Accessen
dc.subjectFísica da matéria condensadapt_BR
dc.subjectDeposição por sputteringpt_BR
dc.subjectTamanho de grãopt_BR
dc.subjectMateriais nanoestruturadospt_BR
dc.subjectNanotubospt_BR
dc.subjectFilmes finospt_BR
dc.subjectAlumíniopt_BR
dc.titleThe influence of aluminum grain size on alumina nanoporous structurept_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000731674pt_BR
dc.type.originEstrangeiropt_BR


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