Navegação Ciências Exatas e da Terra por Assunto "Heavy ion beam lithography"
Resultados 1-1 de 1
-
Direct etching of SiO2 and Al2O3 by 900-keV gold ions
(2009) [Artigo de periódico]We report the direct etching of Al2O3 and SiO2 using 900-keV Au+ ions. 2000-mesh Cu grids were employed as masks using two different configurations: 1 the Cu mesh was placed on top of each insulator separately and independent ...