• Electrical isolation of a silicon [Delta]-doped layer in GaAs by ion irradiation 

      Danilov, Iuri; Souza, Joel Pereira de; Boudinov, Henri Ivanov; Murel, A.V.; Shashkin, V.I. (1999) [Artigo de periódico]
      The electrical isolation of a n-type d -doped layer embedded into undoped GaAs was studied using proton or helium ion bombardment. The threshold dose for isolation Dth of the d -doped layer was found to be '2 times higher ...