Dynamics of thermal growth of silicon oxide films on Si
dc.contributor.author | Almeida, Rita Maria Cunha de | pt_BR |
dc.contributor.author | Goncalves, Sebastian | pt_BR |
dc.contributor.author | Baumvol, Israel Jacob Rabin | pt_BR |
dc.contributor.author | Stedile, Fernanda Chiarello | pt_BR |
dc.date.accessioned | 2014-09-26T02:10:53Z | pt_BR |
dc.date.issued | 2000 | pt_BR |
dc.identifier.issn | 1098-0121 | pt_BR |
dc.identifier.uri | http://hdl.handle.net/10183/103853 | pt_BR |
dc.description.abstract | Thermal growth of silicon oxide films on Si in dry O₂ is modeled as a dynamical system, assuming that it is basically a reaction-diffusion phenomenon. Relevant findings of the last decade are incorporated, as structure and composition of the oxide/Si interface and O₂ transport and reaction at initial stages of growth. The present model departs from the well-established Deal and Grove framework [B. E. Deal and A. S. Grove, J. Appl. Phys. 36, 3770 (1965)] indicating that its basic assumptions, steady-state regime, and reaction between O₂ and Si at a sharp oxide/Si interface are only attained asymptotically. Scaling properties of these model equations are explored, and experimental growth kinetics, obtained for a wide range of growth parameters including the small thickness range, are shown to be well described by the model. | en |
dc.format.mimetype | application/pdf | pt_BR |
dc.language.iso | eng | pt_BR |
dc.relation.ispartof | Physical review. B, Condensed matter and materials physics. Woodbury. Vol. 61, no. 19 (May 2000), p. 12992-12999 | pt_BR |
dc.rights | Open Access | en |
dc.subject | Difusão | pt_BR |
dc.subject | Semicondutores elementares | pt_BR |
dc.subject | Oxidação | pt_BR |
dc.subject | Silicones | pt_BR |
dc.subject | Filmes finos | pt_BR |
dc.subject | Silício | pt_BR |
dc.subject | Expansão térmica | pt_BR |
dc.title | Dynamics of thermal growth of silicon oxide films on Si | pt_BR |
dc.type | Artigo de periódico | pt_BR |
dc.identifier.nrb | 000274747 | pt_BR |
dc.type.origin | Estrangeiro | pt_BR |
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