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Formation of Ge nanoparticles in SiOxNy by ion implantation and thermal annealing

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Formation of Ge nanoparticles in SiOxNy by ion implantation and thermal annealing

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Título Formation of Ge nanoparticles in SiOxNy by ion implantation and thermal annealing
Autor Mirzaei, Sahar
Kremer, Felipe
Sprouster, David J.
Araújo, Leandro Langie
Feng, Ruixing
Glover, C. J.
Ridgway, M.C.
Abstract Germanium nanoparticles embedded within dielectric matrices hold much promise for applications in optoelectronic and electronic devices. Here we investigate the formation of Ge nanoparticles in amorphous SiO1.67N0.14 as a function of implanted atom concentration and thermal annealing temperature. Using x-ray absorption spectroscopy and other complementary techniques, we show Ge nanoparticles exhibit significant finite-size effects such that the coordination number decreases and structural disorder increases as the nanoparticle size decreases. While the composition of SiO1.67N0.14 is close to that of SiO2, we demonstrate that the addition of this small fraction of N yields a much reduced nanoparticle size relative to those formed in SiO2 under comparable implantation and annealing conditions. We attribute this difference to an increase in an atomic density and a much reduced diffusivity of Ge in the oxynitride matrix. These results demonstrate the potential for tailoring Ge nanoparticle sizes and structural properties in the SiOxNy matrices by controlling the oxynitride stoichiometry.
Contido em Journal of applied physics. New York. Vol. 118, no. 15 (Oct. 2015), 154309, 6 p.
Assunto Espectroscopia de absorção de raios-x
Germânio
Implantacao ionica
Nanoparticulas
Origem Estrangeiro
Tipo Artigo de periódico
URI http://hdl.handle.net/10183/164867
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